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The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate

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@article{IJASEIT986,
   author = {Nur Sa’adah Muhamad Sauki and Nur Amalina Muhamad and Fazlinashatul Suhaidah Zahid and Sukreen Hana Herman and Zairi Ismael Rizman},
   title = {The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate},
   journal = {International Journal on Advanced Science, Engineering and Information Technology},
   volume = {7},
   number = {3},
   year = {2017},
   pages = {822--828},
   keywords = {ZnO thin films; substrate temperatures; Teflon substrate; RF magnetron sputtering},
   abstract = {Zinc oxide (ZnO) thin films were deposited on Teflon substrates by radio frequency (RF) magnetron sputtering method at different substrate temperature. The dependence of residual stress on the substrate temperature was investigated in this work due to the growth process, the bombardment of energetic particles and process heating to the deposited thin films. From field emission scanning electron microscope (FESEM) images, samples that deposited at various substrate temperatures consists nano-sized particles. The obtained X-ray diffraction (XRD) results, it suggested that ZnO thin film deposited at 40oC with highly c-axis oriented shows unstressed film compared to other thin films. Besides that, the ZnO thin films deposited at 40oC shows improved electrical properties.},
   issn = {2088-5334},
   publisher = {INSIGHT - Indonesian Society for Knowledge and Human Development},
   url = {http://ijaseit.insightsociety.org/index.php?option=com_content&view=article&id=9&Itemid=1&article_id=986},
   doi = {10.18517/ijaseit.7.3.986}
}

EndNote

%A Muhamad Sauki, Nur Sa’adah
%A Muhamad, Nur Amalina
%A Zahid, Fazlinashatul Suhaidah
%A Herman, Sukreen Hana
%A Rizman, Zairi Ismael
%D 2017
%T The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate
%B 2017
%9 ZnO thin films; substrate temperatures; Teflon substrate; RF magnetron sputtering
%! The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate
%K ZnO thin films; substrate temperatures; Teflon substrate; RF magnetron sputtering
%X Zinc oxide (ZnO) thin films were deposited on Teflon substrates by radio frequency (RF) magnetron sputtering method at different substrate temperature. The dependence of residual stress on the substrate temperature was investigated in this work due to the growth process, the bombardment of energetic particles and process heating to the deposited thin films. From field emission scanning electron microscope (FESEM) images, samples that deposited at various substrate temperatures consists nano-sized particles. The obtained X-ray diffraction (XRD) results, it suggested that ZnO thin film deposited at 40oC with highly c-axis oriented shows unstressed film compared to other thin films. Besides that, the ZnO thin films deposited at 40oC shows improved electrical properties.
%U http://ijaseit.insightsociety.org/index.php?option=com_content&view=article&id=9&Itemid=1&article_id=986
%R doi:10.18517/ijaseit.7.3.986
%J International Journal on Advanced Science, Engineering and Information Technology
%V 7
%N 3
%@ 2088-5334

IEEE

Nur Sa’adah Muhamad Sauki,Nur Amalina Muhamad,Fazlinashatul Suhaidah Zahid,Sukreen Hana Herman and Zairi Ismael Rizman,"The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate," International Journal on Advanced Science, Engineering and Information Technology, vol. 7, no. 3, pp. 822-828, 2017. [Online]. Available: http://dx.doi.org/10.18517/ijaseit.7.3.986.

RefMan/ProCite (RIS)

TY  - JOUR
AU  - Muhamad Sauki, Nur Sa’adah
AU  - Muhamad, Nur Amalina
AU  - Zahid, Fazlinashatul Suhaidah
AU  - Herman, Sukreen Hana
AU  - Rizman, Zairi Ismael
PY  - 2017
TI  - The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate
JF  - International Journal on Advanced Science, Engineering and Information Technology; Vol. 7 (2017) No. 3
Y2  - 2017
SP  - 822
EP  - 828
SN  - 2088-5334
PB  - INSIGHT - Indonesian Society for Knowledge and Human Development
KW  - ZnO thin films; substrate temperatures; Teflon substrate; RF magnetron sputtering
N2  - Zinc oxide (ZnO) thin films were deposited on Teflon substrates by radio frequency (RF) magnetron sputtering method at different substrate temperature. The dependence of residual stress on the substrate temperature was investigated in this work due to the growth process, the bombardment of energetic particles and process heating to the deposited thin films. From field emission scanning electron microscope (FESEM) images, samples that deposited at various substrate temperatures consists nano-sized particles. The obtained X-ray diffraction (XRD) results, it suggested that ZnO thin film deposited at 40oC with highly c-axis oriented shows unstressed film compared to other thin films. Besides that, the ZnO thin films deposited at 40oC shows improved electrical properties.
UR  - http://ijaseit.insightsociety.org/index.php?option=com_content&view=article&id=9&Itemid=1&article_id=986
DO  - 10.18517/ijaseit.7.3.986

RefWorks

RT Journal Article
ID 986
A1 Muhamad Sauki, Nur Sa’adah
A1 Muhamad, Nur Amalina
A1 Zahid, Fazlinashatul Suhaidah
A1 Herman, Sukreen Hana
A1 Rizman, Zairi Ismael
T1 The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate
JF International Journal on Advanced Science, Engineering and Information Technology
VO 7
IS 3
YR 2017
SP 822
OP 828
SN 2088-5334
PB INSIGHT - Indonesian Society for Knowledge and Human Development
K1 ZnO thin films; substrate temperatures; Teflon substrate; RF magnetron sputtering
AB Zinc oxide (ZnO) thin films were deposited on Teflon substrates by radio frequency (RF) magnetron sputtering method at different substrate temperature. The dependence of residual stress on the substrate temperature was investigated in this work due to the growth process, the bombardment of energetic particles and process heating to the deposited thin films. From field emission scanning electron microscope (FESEM) images, samples that deposited at various substrate temperatures consists nano-sized particles. The obtained X-ray diffraction (XRD) results, it suggested that ZnO thin film deposited at 40oC with highly c-axis oriented shows unstressed film compared to other thin films. Besides that, the ZnO thin films deposited at 40oC shows improved electrical properties.
LK http://ijaseit.insightsociety.org/index.php?option=com_content&view=article&id=9&Itemid=1&article_id=986
DO  - 10.18517/ijaseit.7.3.986